Molecular-ruler nanolithography

Charan Srinivasan; J. Nathan Hohman; Mary E. Anderson; Pengpeng Zhang; Paul S. Weiss; Mark W. Horn

doi:10.1117/12.712230

15 March 2007 Molecular-ruler nanolithography

Charan Srinivasan, J. Nathan Hohman, Mary E. Anderson, Pengpeng Zhang, Paul S. Weiss, Mark W. Horn

Proceedings Volume 6517, Emerging Lithographic Technologies XI; 65171I (2007) https://doi.org/10.1117/12.712230
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

Molecular-ruler nanolithography uses individual molecules as building blocks to create nanometer-scale features in a low-cost, high-throughput process. Self-assembled multilayers are used in combination with radiation-sensitive polymeric resists to interface nanometer-scale features with structures fabricated using conventional lithographic methods. This technique is advantageous for its high precision, parallel processing, and low capital investment. Here, we provide an overview of molecular-ruler nanolithography and describe how this technology is being applied to the creation of nanometer-scale devices, patterning of large-area sub-200-nm grating structures, and the fabrication of quartz templates for use as molds in imprint lithography.

Citation Download Citation

Charan Srinivasan, J. Nathan Hohman, Mary E. Anderson, Pengpeng Zhang, Paul S. Weiss, and Mark W. Horn "Molecular-ruler nanolithography", Proc. SPIE 6517, Emerging Lithographic Technologies XI, 65171I (15 March 2007); https://doi.org/10.1117/12.712230

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