Direct three-dimensional nanoscale thermal lithography at high speeds using heated atomic-force microscope cantilevers

Yueming Hua; Shubham Saxena; Jung Chul Lee; William P. King; Clifford L. Henderson

doi:10.1117/12.713374

21 March 2007 Direct three-dimensional nanoscale thermal lithography at high speeds using heated atomic-force microscope cantilevers

Yueming Hua, Shubham Saxena, Jung Chul Lee, William P. King, Clifford L. Henderson

Author Affiliations +

Proceedings Volume 6517, Emerging Lithographic Technologies XI; 65171L (2007) https://doi.org/10.1117/12.713374
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

This paper reports a novel lithography method that utilizes local nanoscale thermal decomposition of polymer films using heated atomic force microscope cantilever probe tips. Cross-linkable polymers, for example based on poly(hydroxystyrene) (also referred to as PHOST), are used as the writing material in these methods. The experimental results show that the cross-linked polymer can prevent the thermal flowing induced by melting of the polymer, and very fine feature can be achieved. 100 nm lines have been successfully written using a heated cantilever probe in a cross-linked PHOST film. 60 &mgr;m/sec writing speeds have also been achieved using this technology. The amount of material decomposed by the heated tip can be very well controlled by modulating both the cantilever probe temperature and writing speed. This ability to modulate the removal rate of material from the film makes it possible to directly pattern 3-D structures into a polymer film using such heated AFM cantilever tips.

Citation Download Citation

Yueming Hua, Shubham Saxena, Jung Chul Lee, William P. King, and Clifford L. Henderson "Direct three-dimensional nanoscale thermal lithography at high speeds using heated atomic-force microscope cantilevers", Proc. SPIE 6517, Emerging Lithographic Technologies XI, 65171L (21 March 2007); https://doi.org/10.1117/12.713374

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