Status and path to a final EUVL reticle-handling solution

Long He; Kevin Orvek; Phil Seidel; Stefan Wurm; Jon Underwood; Ernie Betancourt

doi:10.1117/12.712872

15 March 2007 Status and path to a final EUVL reticle-handling solution

Long He, Kevin Orvek, Phil Seidel, Stefan Wurm, Jon Underwood, Ernie Betancourt

Proceedings Volume 6517, Emerging Lithographic Technologies XI; 65171O (2007) https://doi.org/10.1117/12.712872
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

In extreme ultraviolet lithography (EUVL), the lack of a suitable material to build conventional pellicles calls for industry standardization of new techniques for protection and handling throughout the reticle's lifetime. This includes reticle shipping, robotic handling, in-fab transport, storage, and uses in atmospheric environments for metrology and vacuum environments for EUV exposure. In this paper, we review the status of the industry-wide progress in developing EUVL reticle-handling solutions. We show the industry's leading reticle carrier approaches for particle-free protection, such as improvements in conventional single carrier designs and new EUVL-specific carrier concepts, including variations on a removable pellicle. Our test indicates dual pod approach of the removable pellicle led to nearly particle-free use during a simulated life cycle, at ~50nm inspection sensitivity. We will provide an assessment of the remaining technical challenges facing EUVL reticle-handling technology. Finally, we will review the progress of the SEMI EUVL Reticle-handling Task Force in its efforts to standardize a final EUV reticle protection and handling solution.

Citation Download Citation

Long He, Kevin Orvek, Phil Seidel, Stefan Wurm, Jon Underwood, and Ernie Betancourt "Status and path to a final EUVL reticle-handling solution", Proc. SPIE 6517, Emerging Lithographic Technologies XI, 65171O (15 March 2007); https://doi.org/10.1117/12.712872

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available