Design of metal slits for higher harmonic fringe patterns generated with surface plasmon interference lithography

Yunmi Lee; Sinjeung Park; Eungman Lee; Kyoungsik Kim; Jae W. Hahn

doi:10.1117/12.712522

15 March 2007 Design of metal slits for higher harmonic fringe patterns generated with surface plasmon interference lithography

Yunmi Lee, Sinjeung Park, Eungman Lee, Kyoungsik Kim, Jae W. Hahn

Author Affiliations +

Proceedings Volume 6517, Emerging Lithographic Technologies XI; 651722 (2007) https://doi.org/10.1117/12.712522
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

In this paper, based on numerical study using the finite difference time domain method, we designed metal slits for higher harmonic fringe patterns generated with surface plasmon interference lithography. The slits were designed to generate higher fringe patterns having high intensity output, high contrast and good uniformity in sub-100nm scale. After fabricating several types of slits on aluminum film mask according to the calculated designs with a focused ion beam facility, lithography experiments using the aluminum slits were performed to record the near-filed fringe patterns using i-line Hg lamp and SU-8 negative photoresist.

Citation Download Citation

Yunmi Lee, Sinjeung Park, Eungman Lee, Kyoungsik Kim, and Jae W. Hahn "Design of metal slits for higher harmonic fringe patterns generated with surface plasmon interference lithography", Proc. SPIE 6517, Emerging Lithographic Technologies XI, 651722 (15 March 2007); https://doi.org/10.1117/12.712522

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