Evaluation and selection of EUVL-grade TiO2-SiO2 ultra-low-expansion glasses using the line-focus-beam ultrasonic material characterization system

Mototaka Arakawa; Yuji Ohashi; Jun-ichi Kushibiki

doi:10.1117/12.712203

15 March 2007 Evaluation and selection of EUVL-grade TiO2-SiO2 ultra-low-expansion glasses using the line-focus-beam ultrasonic material characterization system

Mototaka Arakawa, Yuji Ohashi, Jun-ichi Kushibiki

Author Affiliations +

Proceedings Volume 6517, Emerging Lithographic Technologies XI; 651725 (2007) https://doi.org/10.1117/12.712203
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

We proposed a new coefficient-of-thermal-expansion (CTE) evaluation method for ultra-low expansion glasses using the line-focus-beam ultrasonic material characterization system. In this paper, we investigated evaluation procedures for photomasks and optical mirrors with practical size used as reflective optics in extreme ultraviolet lithography (EUVL) systems. Two specimens were prepared with their surfaces parallel to the striae plane from commercial TiO₂-SiO₂ ultralow- expansion glass ingots. Homogeneities/inhomogeneities of specimens were evaluated at 225 MHz. Evaluation procedures with sufficient accuracy were established for analysis of striae parameters such as striae periodicity and variations. Our ultrasonic method should be standardized as a new evaluation method not only for development of the EUVL-grade glass and evaluation of the production processes, but also for quality control and selection of the production lots.

Citation Download Citation

Mototaka Arakawa, Yuji Ohashi, and Jun-ichi Kushibiki "Evaluation and selection of EUVL-grade TiO2-SiO2 ultra-low-expansion glasses using the line-focus-beam ultrasonic material characterization system", Proc. SPIE 6517, Emerging Lithographic Technologies XI, 651725 (15 March 2007); https://doi.org/10.1117/12.712203

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