Characteristics and prevention of pattern collapse in EUV lithography

Wook Chang; Eun-Jin Kim; Young-Min Kang; Seung-Wook Park; Chang-Moon Lim; Ki-Tak Won; Jai-Soon Kim; Hye-Keun Oh

doi:10.1117/12.712469

21 March 2007 Characteristics and prevention of pattern collapse in EUV lithography

Wook Chang, Eun-Jin Kim, Young-Min Kang, Seung-Wook Park, Chang-Moon Lim, Ki-Tak Won, Jai-Soon Kim, Hye-Keun Oh

Proceedings Volume 6517, Emerging Lithographic Technologies XI; 65172S (2007) https://doi.org/10.1117/12.712469
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

Pattern collapse for line widths under 32 nm printed by extreme ultra-violet lithography (EUVL) is investigated by using commercial tools. Pattern collapse phenomenon occurs very often in actual process. Pattern collapse means that pattern is bending, peel-off, and break of the resist, thus it affects the production and yield of semiconductor. In this paper, we newly defined and investigated the critical aspect ratio. Pattern collapse happens if the critical aspect ratio is smaller than aspect ratio. Because EUV resist has smaller adhesive strength than currently available DUV and ArF resists, EUV resist easily collapse more easily than DUV resist does. This phenomenon is successfully modeled.

Citation Download Citation

Wook Chang, Eun-Jin Kim, Young-Min Kang, Seung-Wook Park, Chang-Moon Lim, Ki-Tak Won, Jai-Soon Kim, and Hye-Keun Oh "Characteristics and prevention of pattern collapse in EUV lithography", Proc. SPIE 6517, Emerging Lithographic Technologies XI, 65172S (21 March 2007); https://doi.org/10.1117/12.712469

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