High-accuracy EUV reflectometer

U. Hinze; M. Fokoua; B. Chichkov

doi:10.1117/12.712853

21 March 2007 High-accuracy EUV reflectometer

U. Hinze, M. Fokoua, B. Chichkov

Proceedings Volume 6517, Emerging Lithographic Technologies XI; 651732 (2007) https://doi.org/10.1117/12.712853
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

Developers and users of EUV-optics need precise tools for the characterization of their products. Often a measurement accuracy of 0.1% or better is desired to detect and study slow-acting aging effect or degradation by organic contaminants. To achieve a measurement accuracy of 0.1% an EUV-source is required which provides an excellent long-time stability, namely power stability, spatial stability and spectral stability. Naturally, it should be free of debris. An EUV-source particularly suitable for this task is an advanced electron-based EUV-tube. This EUV source provides an output of up to 300 μW at 13.5 nm. Reflectometers benefit from the excellent long-time stability of this tool. We design and set up different reflectometers using EUV-tubes for the precise characterisation of EUV-optics, such as debris samples, filters, multilayer mirrors, grazing incidence optics, collectors and masks. Reflectivity measurements from grazing incidence to near normal incidence as well as transmission studies were realised at a precision of down to 0.1%. The reflectometers are computer-controlled and allow varying and scanning all important parameters online. The concepts of a sample reflectometer is discussed and results are presented. The devices can be purchased from the Laser Zentrum Hannover e.V.

Citation Download Citation

U. Hinze, M. Fokoua, and B. Chichkov "High-accuracy EUV reflectometer", Proc. SPIE 6517, Emerging Lithographic Technologies XI, 651732 (21 March 2007); https://doi.org/10.1117/12.712853

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