CAD-based line/space mix-up prevention for reticle metrology

Thomas Marschner; Maik Enger; Frank Ludewig; Reuven Falah; Sergey Latinsky; Ofer Lindman; Thomas Coleman

doi:10.1117/12.712523

5 April 2007 CAD-based line/space mix-up prevention for reticle metrology

Thomas Marschner, Maik Enger, Frank Ludewig, Reuven Falah, Sergey Latinsky, Ofer Lindman, Thomas Coleman

Proceedings Volume 6518, Metrology, Inspection, and Process Control for Microlithography XXI; 65181W (2007) https://doi.org/10.1117/12.712523
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

This paper describes a method to automatically distinguish between line and space for 1:1 line space patterns in mask metrology. As the number of measurements typically performed on a reticle is significantly higher than on a wafer, automated CAD based CD-SEM recipe creation is essential. Such recipes typically use synthetic pattern recognition targets instead of SEM based pattern recognition targets. Therefore, a possible different contrast between lines and spaces on a mask cannot be utilized for distinguishing lines from spaces. We demonstrate an algorithm solution based on the analysis of the SEM waveform profiles to identify potential L/S mix-ups and correct them automatically. The solution allows fully automated CAD based offline recipe creation with a high success rate of distinction between lines and spaces for 1:1 pitch cases without the necessity of editing recipes on the tool in advance of performing the measurements.

Citation Download Citation

Thomas Marschner, Maik Enger, Frank Ludewig, Reuven Falah, Sergey Latinsky, Ofer Lindman, and Thomas Coleman "CAD-based line/space mix-up prevention for reticle metrology", Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 65181W (5 April 2007); https://doi.org/10.1117/12.712523

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