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27 March 2007 Future directions for CMOS device technology development from a system application perspective
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Abstract
The development of CMOS technology has been, and will remain, driven by system needs. Traditionally, these needs have been met quite satisfactorily by simply reducing the physical size of the transistors as guided by the MOSFET scaling theory and increasing the chip-level integration density as anticipated from "Moore’s Law." Now that CMOS has reached its scaling limits, continued progress has to come from innovations beyond the traditional development paths, guided by anticipating and addressing system designers' concerns and needs. In this talk, we examine several opportunities for extending current CMOS technology to continue satisfying the needs of system designers.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tak H. Ning "Future directions for CMOS device technology development from a system application perspective", Proc. SPIE 6520, Optical Microlithography XX, 652003 (27 March 2007); https://doi.org/10.1117/12.720629
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