Optical lithography: 40 years and holding

John H. Bruning

doi:10.1117/12.720631

27 March 2007 Optical lithography: 40 years and holding

John H. Bruning

Proceedings Volume 6520, Optical Microlithography XX; 652004 (2007) https://doi.org/10.1117/12.720631
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

Optical lithography has been the dominant patterning process for semiconductor fabrication for over 40 years. The patterning process evolved initially from methods used in the printing industry, but as integrated circuits became more complex, and as device geometries shrank, sophisticated new imaging methods evolved. Today’s optical lithography systems represent the highest resolution, most accurate optical imaging systems ever produced. This remarkable evolutionary process continues to this day, paced by "Moore's Law". The evolutionary development of lithography systems over the last 40 years is reviewed along with a brief discussion of options for the future.

Citation Download Citation

John H. Bruning "Optical lithography: 40 years and holding", Proc. SPIE 6520, Optical Microlithography XX, 652004 (27 March 2007); https://doi.org/10.1117/12.720631

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