Immersion exposure tool for the 45-nm HP mass production

Hiroaki Kubo; Hideo Hata; Fumio Sakai; Nobuyoshi Deguchi; Takehiko Iwanaga; Takeaki Ebihara

doi:10.1117/12.711360

26 March 2007 Immersion exposure tool for 45-nm HP mass production

Hiroaki Kubo, Hideo Hata, Fumio Sakai, Nobuyoshi Deguchi, Takehiko Iwanaga, Takeaki Ebihara

Proceedings Volume 6520, Optical Microlithography XX; 65201X (2007) https://doi.org/10.1117/12.711360
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

Canon has renewed its platform of exposure tools. The new platform, the FPA-7000, is designed to cover multiple generations. The lens performance of the FPA-7000AS5 achieves less than 6m&lgr;, while that of the AS7 is estimated to be less than 4m&lgr;. The illumination performance meets the target required for the 45nm node. The in-situ aberration monitor, called iPMI, attains the measurement repeatability of 1.45m&lgr;. Focus and overlay units have improved process robustness. A solution tool for optimization is introduced to be connected with the FPA-7000. Moreover, latest studies of immersion, such as nozzle pressure, temperature control and defect inspection result are reported, and we also discuss the possibility of high-refractive-index immersion.

Citation Download Citation

Hiroaki Kubo, Hideo Hata, Fumio Sakai, Nobuyoshi Deguchi, Takehiko Iwanaga, and Takeaki Ebihara "Immersion exposure tool for 45-nm HP mass production", Proc. SPIE 6520, Optical Microlithography XX, 65201X (26 March 2007); https://doi.org/10.1117/12.711360

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