Laser durability studies of high index immersion fluids: fluid degradation and optics contamination effects

V. Liberman; M. Rothschild; S. T. Palmacci; P. A. Zimmerman; A. Grenville

doi:10.1117/12.723958

27 March 2007 Laser durability studies of high index immersion fluids: fluid degradation and optics contamination effects

V. Liberman, M. Rothschild, S. T. Palmacci, P. A. Zimmerman, A. Grenville

Author Affiliations +

Proceedings Volume 6520, Optical Microlithography XX; 652035 (2007) https://doi.org/10.1117/12.723958
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

An extension of water-based immersion lithography involves replacing water with a higher index transparent oil. Understandably, potential lens contamination is a major concern for an all-organic immersion fluid. We have constructed an experimental system for controlled irradiation of high index fluids, including capabilities for in-situ cleaning of potential deposits. We present results of laser-irradiation of several high index immersion fluid candidates. Using properly developed exposure metrics, we discuss implications for fluid lifetimes in an immersion system, with and without in-situ purification. Using our in-situ metrology, we are able to decouple bulk fluid degradation from window photocontamination for several fluids. We find a significant variation in optics contamination rate depending on the fluid tested. Even the slowest observed contamination rates would require some remediation strategies to remove the built-up deposit from the final element surface. We also present results of irradiation of model hydrocarbon compound fluids. Irradiation of these materials leads to fundamental understanding of underlying photochemistry, and also provides guidance in designing future generation high index fluids.

Citation Download Citation

V. Liberman, M. Rothschild, S. T. Palmacci, P. A. Zimmerman, and A. Grenville "Laser durability studies of high index immersion fluids: fluid degradation and optics contamination effects", Proc. SPIE 6520, Optical Microlithography XX, 652035 (27 March 2007); https://doi.org/10.1117/12.723958

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available