Illumination optimization with actual information of exposure tool and resist process

Koichiro Tsujita; Koji Mikami; Ryotaro Naka; Norikazu Baba; Tomomi Ono; Akiyoshi Suzuki

doi:10.1117/12.711048

26 March 2007 Illumination optimization with actual information of exposure tool and resist process

Koichiro Tsujita, Koji Mikami, Ryotaro Naka, Norikazu Baba, Tomomi Ono, Akiyoshi Suzuki

Proceedings Volume 6520, Optical Microlithography XX; 652036 (2007) https://doi.org/10.1117/12.711048
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

A solution tool to optimize exposure tool functions has been developed. Shown are examples of pattern matching, maximizing ED-window or NILS considering several patterns simultaneously, and so on. From these results, the following conclusions have been derived. Pattern matching whose accuracy less than 1nm can be attained flexibly by tuning illumination. Ideal illumination for hole patterns through pitches are shown and the results are sensitive to setting of exposure latitude of ED-window. Evaluation conditions such as evaluated locations and their numbers have impact on the optimization results. An optimized illumination of a device pattern varies according to k1 factor. And it is important to apply OPC during illumination optimization in case of optimizing several patterns. A model of resist simulation created by an exposure condition should be available for various exposure conditions during optimization. For this purpose an image log slope and a pattern curvature have strong impact among various characteristics of optical image.

Citation Download Citation

Koichiro Tsujita, Koji Mikami, Ryotaro Naka, Norikazu Baba, Tomomi Ono, and Akiyoshi Suzuki "Illumination optimization with actual information of exposure tool and resist process", Proc. SPIE 6520, Optical Microlithography XX, 652036 (26 March 2007); https://doi.org/10.1117/12.711048

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available