The causes of horizontal-vertical (H-V) bias in optical lithography: dipole source errors

John J. Biafore; Chris A. Mack; Stewart A. Robertson; Mark D. Smith; Sanjay Kapasi

doi:10.1117/12.712864

26 March 2007 The causes of horizontal-vertical (H-V) bias in optical lithography: dipole source errors

John J. Biafore, Chris A. Mack, Stewart A. Robertson, Mark D. Smith, Sanjay Kapasi

Proceedings Volume 6520, Optical Microlithography XX; 65203V (2007) https://doi.org/10.1117/12.712864
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

Horizontal-Vertical (H-V) bias is the systematic difference in linewidth between closely located horizontally and vertically oriented resist features that, other than orientation, should be identical. There are two major causes of H-V bias: astigmatism, which causes an H-V bias that varies through focus, and illumination source errors such as telecentricity error. In this paper, the effects of simple dipole source errors upon H-V bias and placement error through focus are explored through simulation.

Citation Download Citation

John J. Biafore, Chris A. Mack, Stewart A. Robertson, Mark D. Smith, and Sanjay Kapasi "The causes of horizontal-vertical (H-V) bias in optical lithography: dipole source errors", Proc. SPIE 6520, Optical Microlithography XX, 65203V (26 March 2007); https://doi.org/10.1117/12.712864

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