Paper
24 September 1986 Evaluation And Control Of The Properties Of Thin Sputtered Silver Films For Spectrally Selective Coatings.
J Szczyrbowski, A Dietrich, K Hartig
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Abstract
The influence of the deposition parameters on the electrical and optical properties of very thin silver films prepared by magnetron sputtering was studied. To evaluate the film properties a method was used, which is based on simple optical transmission measurements, and was proposed recently by one of the authors /1/. The results show that the specific resistivity, the plasma energy and the optical resistivity of films below 30 nm thickness are very sensitive to deposition parameters as cathode power density. It is concluded that the obtained variations in the optical and electrical properties are related to the density of the sputtered films.
© (1986) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
J Szczyrbowski, A Dietrich, and K Hartig "Evaluation And Control Of The Properties Of Thin Sputtered Silver Films For Spectrally Selective Coatings.", Proc. SPIE 0653, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion V, (24 September 1986); https://doi.org/10.1117/12.938322
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KEYWORDS
Plasma

Silver

Thin films

Transmittance

Sputter deposition

Solar energy

Reflectivity

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