Hybrid nanoimprint for micro-nano mixture structure

Keisuke Okuda; Naoyuki Niimi; Hiroaki Kawata; Yoshihiko Hirai

doi:10.1117/12.736928

3 May 2007 Hybrid nanoimprint for micro-nano mixture structure

Keisuke Okuda, Naoyuki Niimi, Hiroaki Kawata, Yoshihiko Hirai

Proceedings Volume 6533, 23rd European Mask and Lithography Conference; 65330R (2007) https://doi.org/10.1117/12.736928
Event: European Mask and Lithography Conference2007, 2007, Grenoble, France

Abstract

Hybrid patterning by thermal and UV nanoimprint lithography is newly proposed to fabricate micro-nano mixture structures. The SU-8 resist is thermally imprinted using the quartz mold, which has fine nano structures and micro Cr blank patterns. After the thermal nanoimprint, UV is exposed keeping the mold on the resist through the mold. Then, the mold is detached and the resist is developed to fabricate micro structures. Using this process, micro gratings having 40 μm in width and 20 μm in depth nano dots pattern, which has 200 nm feature size is successfully demonstrated.

Citation Download Citation

Keisuke Okuda, Naoyuki Niimi, Hiroaki Kawata, and Yoshihiko Hirai "Hybrid nanoimprint for micro-nano mixture structure", Proc. SPIE 6533, 23rd European Mask and Lithography Conference, 65330R (3 May 2007); https://doi.org/10.1117/12.736928

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