Paper
3 May 2007 Achieving mask order processing automation, interoperability and standardization based on P10
B. Rodriguez, O. Filies, D. Sadran, Michel Tissier, D. Albin, S. Stavroulakis, E. Voyiatzis
Author Affiliations +
Proceedings Volume 6533, 23rd European Mask and Lithography Conference; 65330V (2007) https://doi.org/10.1117/12.736964
Event: European Mask and Lithography Conference2007, 2007, Grenoble, France
Abstract
Last year the MUSCLE (Masks through User's Supply Chain: Leadership by Excellence) project was presented. Here is the project advancement. A key process in mask supply chain management is the exchange of technical information for ordering masks. This process is large, complex, company specific and error prone, and leads to longer cycle times and higher costs due to missing or wrong inputs. Its automation and standardization could produce significant benefits. We need to agree on the standard for mandatory and optional parameters, and also a common way to describe parameters when ordering. A system was created to improve the performance in terms of Key Performance Indicators (KPIs) such as cycle time and cost of production. This tool allows us to evaluate and measure the effect of factors, as well as the effect of implementing the improvements of the complete project. Next, a benchmark study and a gap analysis were performed. These studies show the feasibility of standardization, as there is a large overlap in requirements. We see that the SEMI P10 standard needs enhancements. A format supporting the standard is required, and XML offers the ability to describe P10 in a flexible way. Beyond using XML for P10, the semantics of the mask order should also be addressed. A system design and requirements for a reference implementation for a P10 based management system are presented, covering a mechanism for the evolution and for version management and a design for P10 editing and data validation.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
B. Rodriguez, O. Filies, D. Sadran, Michel Tissier, D. Albin, S. Stavroulakis, and E. Voyiatzis "Achieving mask order processing automation, interoperability and standardization based on P10", Proc. SPIE 6533, 23rd European Mask and Lithography Conference, 65330V (3 May 2007); https://doi.org/10.1117/12.736964
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KEYWORDS
Photomasks

Data modeling

Performance modeling

Manufacturing

Process modeling

Prototyping

Mask making

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