Hydrogenated water application for particle removal on EUV mask blank substrates

Sean Eichenlaub; Abbas Rastegar; Peter Dress; Fei Xu; Pat Marmillion

doi:10.1117/12.737174

3 May 2007 Hydrogenated water application for particle removal on EUV mask blank substrates

Sean Eichenlaub, Abbas Rastegar, Peter Dress, Fei Xu, Pat Marmillion

Proceedings Volume 6533, 23rd European Mask and Lithography Conference; 653311 (2007) https://doi.org/10.1117/12.737174
Event: European Mask and Lithography Conference2007, 2007, Grenoble, France

Abstract

The capability of hydrogenated water to clean EUV blank substrates was examined. The hydrogenated water cleaning process was compared with an H₂O₂/NH₄OH/H₂O mixture (SC1) and ozonated water cleaning processes. A small amount ammonia added to the hydrogenated water improved the particle removal efficiency. The concentration of hydrogen and the method used to dispense the water had little effect. The use of ozonated and hydrogenated water together gave high particle removal efficiencies, which were similar to those obtained using SC1. Additionally, the use of ozonated water with hydrogenated water further reduced the amount ammonia required to achieve high particle removal efficiencies. With further process optimization hydrogenated and ozonated water has the potential to replace SC1 in cleaning EUV substrates.

Citation Download Citation

Sean Eichenlaub, Abbas Rastegar, Peter Dress, Fei Xu, and Pat Marmillion "Hydrogenated water application for particle removal on EUV mask blank substrates", Proc. SPIE 6533, 23rd European Mask and Lithography Conference, 653311 (3 May 2007); https://doi.org/10.1117/12.737174

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