Damage free megasonic resonance cleaning for the 45nm design rule

Steve Osborne; Valentine Baudiquez; Thomas Rode; Christian Chovino; Hidekazu Takahashi; Eric Woster

doi:10.1117/12.736531

3 May 2007 Damage free megasonic resonance cleaning for the 45nm design rule

Steve Osborne, Valentine Baudiquez, Thomas Rode, Christian Chovino, Hidekazu Takahashi, Eric Woster

Proceedings Volume 6533, 23rd European Mask and Lithography Conference; 65331D (2007) https://doi.org/10.1117/12.736531
Event: European Mask and Lithography Conference2007, 2007, Grenoble, France

Abstract

Scatter bar (SB) breakage presents a mounting confrontation for final cleaning of masks While the industry is strongly dependent on megasonic (MS) energy, MS is hazardous to scatter bars which approach the size of particles which must be removed. The difference in energy needed to remove small particles and the energy needed to remove small features represents a subtle and shrinking domain. Here we observe cleaning effects when the plate is inverted. This gives us a look that at affects which might otherwise remain hidden. We provide evidence of plate resonance effects and constructive interference from internal reflection We assess the ability to clean a plate without direct exposure to the MS beam We adapt a MS bath qualification method for use on spinning plates and use it to assay cavitation activity and uniformity for Upright and Inverted spinning plates. Cavitation activity is recorded in the spalling on a metallic film, which allows quantification by optical reflectance measurements. Value to both cleaning and SB breakage are assessed.

Citation Download Citation

Steve Osborne, Valentine Baudiquez, Thomas Rode, Christian Chovino, Hidekazu Takahashi, and Eric Woster "Damage free megasonic resonance cleaning for the 45nm design rule", Proc. SPIE 6533, 23rd European Mask and Lithography Conference, 65331D (3 May 2007); https://doi.org/10.1117/12.736531

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