Efficient light-emitting microstructures induced by EUV radiation in thermally evaporated lithium fluoride thin films

Rosa Maria Montereali; Salvatore Almaviva; Francesca Bonfigli; Anatoly Faenov; Francesco Flora; Ivano Franzini; Enrico Nichelatti; Tatiana Pikuz; Maria Aurora Vincenti; Giuseppe Baldacchini

doi:10.1117/12.724182

12 June 2007 Efficient light-emitting microstructures induced by EUV radiation in thermally evaporated lithium fluoride thin films

Rosa Maria Montereali, Salvatore Almaviva, Francesca Bonfigli, Anatoly Faenov, Francesco Flora, Ivano Franzini, Enrico Nichelatti, Tatiana Pikuz, Maria Aurora Vincenti, Giuseppe Baldacchini

Author Affiliations +

Proceedings Volume 6593, Photonic Materials, Devices, and Applications II; 65932B (2007) https://doi.org/10.1117/12.724182
Event: Microtechnologies for the New Millennium, 2007, Maspalomas, Gran Canaria, Spain

Abstract

Among insulating materials containing point defects, Lithium Fluoride, LiF, is a radiation sensitive material well known in dosimetry and as active medium in optically pumped optolectronic devices. Primary and aggregate electronic defects, known as colour centres (CCs), can be efficiently produced in LiF by low-penetrating radiation. A novel imaging detector for soft X-ray microscopy, based on photoluminescence from laser active CCs, is currently under development. The continuous shrinking dimensions of photonic devices has prompted us to use thin LiF films, directly grown by thermal evaporation on different substrates, as recording media in Extreme Ultra-Violet contact-lithography experiments for the fabrication of permanent, regular, light-emitting microstructures, produced with high spatial resolution on large areas in short exposure times. The experiments were performed by using geometrical masks in an excimer-pumped laser-plasma source and the samples analyzed by confocal laser scanning microscopy. Strong visible photoluminescence at room temperature was measured from very thin surface layers. A preliminary comparison between the optical response of CCs in thin LiF films grown on glass and silicon substrates with respect to LiF crystals was performed. The polycrystalline LiF films show a higher sensitivity, which is discussed taking into account light confinement effect in the investigated planar structures.

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Rosa Maria Montereali, Salvatore Almaviva, Francesca Bonfigli, Anatoly Faenov, Francesco Flora, Ivano Franzini, Enrico Nichelatti, Tatiana Pikuz, Maria Aurora Vincenti, and Giuseppe Baldacchini "Efficient light-emitting microstructures induced by EUV radiation in thermally evaporated lithium fluoride thin films", Proc. SPIE 6593, Photonic Materials, Devices, and Applications II, 65932B (12 June 2007); https://doi.org/10.1117/12.724182

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KEYWORDS

Laser induced fluorescence

Crystals

Luminescence

Extreme ultraviolet

Silicon

Thin films

X-rays

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