Optimization of HfO2,Al2O3 and SiO2 deposition leading to advanced UV optical coatings with low extinction

Giedrius Abromavičius; Rytis Buzelis; Ramutis Drazdys; Dainius Perednis; Alfridas Skrebutėnas

doi:10.1117/12.726563

25 January 2007 Optimization of HfO₂, Al₂O₃ and SiO₂ deposition leading to advanced UV optical coatings with low extinction

Giedrius Abromavičius, Rytis Buzelis, Ramutis Drazdys, Dainius Perednis, Alfridas Skrebutėnas

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Proceedings Volume 6596, Advanced Optical Materials, Technologies, and Devices; 65961N (2007) https://doi.org/10.1117/12.726563
Event: Advanced Optical Materials, Technologies, and Devices, 2006, Vilnius, Lithuania

Abstract

The performance of optical coatings for UV region (200-300 nm) is closely related to their optical losses. There are a few factors which significantly influence the extinction of deposited coating - deposition vacuum, contamination from filaments of e-beam guns, ion source and finally, the optical properties of selected deposition materials. In this work the contribution of these different factors was investigated and evaluated. HfO₂, Al₂O₃ and SiO₂ are the most widely used materials for producing UV optical coatings down to 200 nm. Influence of background oxygen pressure during HfO₂ and Al₂O₃ deposition was evaluated which enabled to reduce extinction of the deposited UV optical coatings.

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Giedrius Abromavičius, Rytis Buzelis, Ramutis Drazdys, Dainius Perednis, and Alfridas Skrebutėnas "Optimization of HfO₂, Al₂O₃ and SiO₂ deposition leading to advanced UV optical coatings with low extinction", Proc. SPIE 6596, Advanced Optical Materials, Technologies, and Devices, 65961N (25 January 2007); https://doi.org/10.1117/12.726563

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