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We have explored substrate effects upon the characteristics of haze creation on the mask surface by
performing surface analysis for each of Cr, MoSiON, and Qz substrates of the mask before and after laser exposure. We
found out chemical ions such as sulfur and ammonium ions should have different mobility behavior towards haze defect
creation depending on each substrate during laser exposure. This fact can partially clarify the reason why haze
occurrence on the mask in real mass production mainly comes up with Qz substrate surface even though it has the lowest
level of chemical residue on it. We also realized that sulfur ions are penetrating into a sub layer of Qz substrate and even
deeper during laser exposure, which signifies that we may have to remove a thin surface layer from Qz substrate to
further improve haze issue from the current standpoint.
Jaehyuck Choi,Han-shin Lee,Jin-sik Jung,Byung Cheol Cha,Sang-Gyun Woo, andHanKu Cho
"Substrate effects on the characteristics of haze defect formation on the photomask surface under exposure condition", Proc. SPIE 6607, Photomask and Next-Generation Lithography Mask Technology XIV, 660709 (29 May 2007); https://doi.org/10.1117/12.728922
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Jaehyuck Choi, Han-shin Lee, Jin-sik Jung, Byung Cheol Cha, Sang-Gyun Woo, HanKu Cho, "Substrate effects on the characteristics of haze defect formation on the photomask surface under exposure condition," Proc. SPIE 6607, Photomask and Next-Generation Lithography Mask Technology XIV, 660709 (29 May 2007); https://doi.org/10.1117/12.728922