EUV-mask pattern inspection using current DUV reticle inspection tool

Tsukasa Abe; Akiko Fujii; Shiho Sasaki; Hiroshi Mohri; Hidemichi Imai; Hironobu Takaya; Yasushi Sato; Naoya Hayashi; Yumiko Maenaka

doi:10.1117/12.728935

11 May 2007 EUV-mask pattern inspection using current DUV reticle inspection tool

Tsukasa Abe, Akiko Fujii, Shiho Sasaki, Hiroshi Mohri, Hidemichi Imai, Hironobu Takaya, Yasushi Sato, Naoya Hayashi, Yumiko Maenaka

Author Affiliations +

Proceedings Volume 6607, Photomask and Next-Generation Lithography Mask Technology XIV; 66070L (2007) https://doi.org/10.1117/12.728935
Event: Photomask and Next-Generation Lithography Mask Technology XIV, 2007, Yokohama, Japan

Abstract

EUV mask pattern inspection was investigated using current DUV reticle inspection tool. Designed defect pattern of 65nm node and 45nm node were prepared. We compared inspection sensitivity between before buffer etch pattern and after buffer etch pattern, and between die to die mode and die to database mode. Inspection sensitivity difference was not observed between before buffer etch pattern and after buffer etch pattern. In addition to defect inspection, wafer print simulation of program defect was investigated. Simulation results were compared to inspection result. We confirmed current DUV reticle inspection tool has potential for EUV mask defect inspection.

Citation Download Citation

Tsukasa Abe, Akiko Fujii, Shiho Sasaki, Hiroshi Mohri, Hidemichi Imai, Hironobu Takaya, Yasushi Sato, Naoya Hayashi, and Yumiko Maenaka "EUV-mask pattern inspection using current DUV reticle inspection tool", Proc. SPIE 6607, Photomask and Next-Generation Lithography Mask Technology XIV, 66070L (11 May 2007); https://doi.org/10.1117/12.728935

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