Development of a novel EUV mask protection engineering tool and mask handling techniques

Mitsuaki Amemiya; Kazuya Ota; Takashi Kamono; Hiroyoshi Kubo; Youichi Usui; Tadahiko Takikawa; Takao Taguchi; Osamu Suga

doi:10.1117/12.729035

15 May 2007 Development of a novel EUV mask protection engineering tool and mask handling techniques

Mitsuaki Amemiya, Kazuya Ota, Takashi Kamono, Hiroyoshi Kubo, Youichi Usui, Tadahiko Takikawa, Takao Taguchi, Osamu Suga

Author Affiliations +

Proceedings Volume 6607, Photomask and Next-Generation Lithography Mask Technology XIV; 66073G (2007) https://doi.org/10.1117/12.729035
Event: Photomask and Next-Generation Lithography Mask Technology XIV, 2007, Yokohama, Japan

Abstract

We have developed a mask protection engineering tool (MPE Tool) that simulates various types of tests during the transfer of a mask or blank in air and in vacuum. We performed mask transfer experiments to investigate particle-free mask handling techniques using the MPE and mask inspection tools. We measured the number of particles accumulated during the transfer of the mask blanks. Less than 0.3 particles were added over a path from a load port (in air) to an ESC chamber (in vacuum) and more than half the particles accumulated appeared during the pumping down and purging steps in the load-lock chamber. Consequently, we consider that pumping down and purging are the most important steps for particle-free mask handling.

Citation Download Citation

Mitsuaki Amemiya, Kazuya Ota, Takashi Kamono, Hiroyoshi Kubo, Youichi Usui, Tadahiko Takikawa, Takao Taguchi, and Osamu Suga "Development of a novel EUV mask protection engineering tool and mask handling techniques", Proc. SPIE 6607, Photomask and Next-Generation Lithography Mask Technology XIV, 66073G (15 May 2007); https://doi.org/10.1117/12.729035

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