Scatterometry from crossed grating structures in different configurations

Thomas Schuster; Stephan Rafler; Wolfgang Osten; Peter Reinig; Thomas Hingst

doi:10.1117/12.726229

18 June 2007 Scatterometry from crossed grating structures in different configurations

Thomas Schuster, Stephan Rafler, Wolfgang Osten, Peter Reinig, Thomas Hingst

Proceedings Volume 6617, Modeling Aspects in Optical Metrology; 661715 (2007) https://doi.org/10.1117/12.726229
Event: Optical Metrology, 2007, Munich, Germany

Abstract

Scatterometry proved to be a powerful technique for CD and profile metrology. In contrast to alternative methods like scanning electron microscopy (SEM) it is an integral method that reconstructs structure parameters from a comparison between measured and simulated spectra. It is well established in the field of line / space gratings and gaining importance for crossed grating structures. The simulation tool MicroSim, which was developed at the Institute for Technical Optics (ITO) in Stuttgart, has recently been extended to arbitrarily shaped crossed grating structures. Besides the shape also the pitches and mode numbers in the two directions of periodic continuation can be selected freely. In this article, different measurement configurations are discussed regarding as an example an asymmetric crossed grating structure. The depth of an asymmetric etch ought to be measured as well as its width. For the depth a conventional spectroscopic ellipsometric setup can be applied, whereas for the width an angle scan is proposed. In this configuration the wavelength remains constant while the sample is rotated around its normal.

Citation Download Citation

Thomas Schuster, Stephan Rafler, Wolfgang Osten, Peter Reinig, and Thomas Hingst "Scatterometry from crossed grating structures in different configurations", Proc. SPIE 6617, Modeling Aspects in Optical Metrology, 661715 (18 June 2007); https://doi.org/10.1117/12.726229

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