Nano-scale patterning of phospholipid thin films by interferometric UV lithography

Aschalew Kassu; Jean-Michel Taguenang; Anup Sharma

doi:10.1117/12.731248

11 September 2007 Nano-scale patterning of phospholipid thin films by interferometric UV lithography

Aschalew Kassu, Jean-Michel Taguenang, Anup Sharma

Proceedings Volume 6645, Nanoengineering: Fabrication, Properties, Optics, and Devices IV; 664509 (2007) https://doi.org/10.1117/12.731248
Event: NanoScience + Engineering, 2007, San Diego, California, United States

Abstract

Interferometric lithography is one of the techniques used to produce micro and nano-scale periodic patterns like gratings in polymers and other substrates of interest. In this work, holographic surface relief gratings are optically inscribed on spin coated azo-dye (NBD)-labeled phospholipid (phosphatidylcholine) thin films using a low-intensity (10 mW) 244 nm frequency-doubled Ar+ laser. A systematic study of growth and decay of phospholipid grating is reported.

Citation Download Citation

Aschalew Kassu, Jean-Michel Taguenang, and Anup Sharma "Nano-scale patterning of phospholipid thin films by interferometric UV lithography", Proc. SPIE 6645, Nanoengineering: Fabrication, Properties, Optics, and Devices IV, 664509 (11 September 2007); https://doi.org/10.1117/12.731248

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