Characterization of AlF3 thin films in the ultraviolet by magnetron sputtering of aluminum target

Bo-Huei Liao; Ming-Chung Liu; Cheng-Chung Lee

doi:10.1117/12.733550

11 September 2007 Characterization of AlF₃ thin films in the ultraviolet by magnetron sputtering of aluminum target

Bo-Huei Liao, Ming-Chung Liu, Cheng-Chung Lee

Proceedings Volume 6645, Nanoengineering: Fabrication, Properties, Optics, and Devices IV; 66451X (2007) https://doi.org/10.1117/12.733550
Event: NanoScience + Engineering, 2007, San Diego, California, United States

Abstract

Aluminum fluoride thin films have been deposited by magnetron sputtering of aluminum target with CF₄ , or CF₄ mixed 5% O₂ as working gas. To obtain low optical loss and high packing density, the films were investigated under different sputtering power and substrate temperatures. Their optical properties (including the transmittance, refractive index, and extinction coefficient) in the UV range and microstructure (including the cross section morphology, surface roughness, and crystallization) have been studied. AlF₃ thin films deposited at low temperature and low sputtering power have better optical quality. The extinction coefficient of AlF₃ thin films coated by 25W with CF₄ mixed 5% O₂ as working gas is smaller than 6.5×10^-4 in the wavelength range of 190nm to 300nm

Citation Download Citation

Bo-Huei Liao, Ming-Chung Liu, and Cheng-Chung Lee "Characterization of AlF₃ thin films in the ultraviolet by magnetron sputtering of aluminum target", Proc. SPIE 6645, Nanoengineering: Fabrication, Properties, Optics, and Devices IV, 66451X (11 September 2007); https://doi.org/10.1117/12.733550

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