The research of oblique deposition of lanthanum fluoride thin films at 193nm

Ming-Chung Liu; Bo-Huei Liao; Wen-Hao Cho; Cheng-Chung Lee; Cheng-Chung Jaing

doi:10.1117/12.733616

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11 September 2007 The research of oblique deposition of lanthanum fluoride thin films at 193nm

Ming-Chung Liu, Bo-Huei Liao, Wen-Hao Cho, Cheng-Chung Lee, Cheng-Chung Jaing

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Proceedings Volume 6645, Nanoengineering: Fabrication, Properties, Optics, and Devices IV; 66451Y (2007) https://doi.org/10.1117/12.733616
Event: NanoScience + Engineering, 2007, San Diego, California, United States

Abstract

Oblique deposition of lanthanum fluoride thin films was prepared by thermal resistance evaporation. The characteristics (including microstructure, coefficient of tangent rule, birefringence at 193nm and stress) of lanthanum fluoride thin films of have been investigated. The deposition angles increased from 20 to 70 degree, the coefficient of tangent rule decreased from 0.7 to 0.37. When the deposition angles larger than 60 degree, the coefficient held a constant, 0.37. The refractive index at 193nm of oblique deposition films decreased with the deposition angles was larger than 40 degree. The residual stress of films achieved the minimum value at 20-degree deposition angle.

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Ming-Chung Liu, Bo-Huei Liao, Wen-Hao Cho, Cheng-Chung Lee, and Cheng-Chung Jaing "The research of oblique deposition of lanthanum fluoride thin films at 193nm", Proc. SPIE 6645, Nanoengineering: Fabrication, Properties, Optics, and Devices IV, 66451Y (11 September 2007); https://doi.org/10.1117/12.733616

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