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17 September 2007 Optical near-field patterning of photopolymer
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Proceedings Volume 6647, Nanocoatings; 66470I (2007)
Event: NanoScience + Engineering, 2007, San Diego, California, United States
Micro and nano-patterning of photopolymer materials was successfully carried out by using near-field irradiation configuration. In particular, Evanescent Waves created by total internal reflection were used to induce the photocrosslinking of an acrylate-based photopolymer sensitive at 514 nm. We demonstrate here that the thickness of the polymer layer can be tuned from few tens of nm to several microns by controlling the irradiation conditions. The sample was characterized by profilometry, Atomic Force Microscopy and spectroscopy. In addition, relief gratings with adjustable fringe spacing were recorded by interferometric method. Effect of photonic parameters on the gratings geometry is discussed. By changing the irradiation conditions, it is possible to easily obtain patterns with different geometries, which emphasizes the high versatility of the process. This study presents high fundamental interest in the frame of nanofabrication since it provides important information on the effects of confinement at a nanoscale of the photopolymerization reaction. Such data are of primary importance in the field of nanolithography since the effect of parameters such as dye content, oxygen quenching, photonic conditions can be evaluated. Moreover, since the choice of the monomer can be done in a wide range of composition, such nanopatterned polymers surfaces present many interests in the field of optical sensors, photonic crystals, optics, biology...
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Olivier Soppera, Safi Jradi, Carole Ecoffet, and Daniel J. Lougnot "Optical near-field patterning of photopolymer", Proc. SPIE 6647, Nanocoatings, 66470I (17 September 2007);


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