Dynamics analysis of photoelectron decay in cubic AgCl microcrystals by sulfur sensitization

Xiaowei Li; Yanxia Hu; Rongxiang Zhang; Jixian Zhang; Guoyi Dong; Shaopeng Yang; Guangsheng Fu

doi:10.1117/12.783539

14 November 2007 Dynamics analysis of photoelectron decay in cubic AgCl microcrystals by sulfur sensitization

Xiaowei Li, Yanxia Hu, Rongxiang Zhang, Jixian Zhang, Guoyi Dong, Shaopeng Yang, Guangsheng Fu

Proceedings Volume 6722, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 67223H (2007) https://doi.org/10.1117/12.783539
Event: 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirrors and Telescopes, 2007, Chengdu, China

Abstract

The decay curve of free photoelectron in cubic AgCl microcrystals by sulfur sensitization is obtained by microwave absorption dielectric spectrum detection technique. By comparing the free photoelectron decay curves of unsensitized and sensitized sample, we discover that sulfur sensitization centers act as shallow electron trap when sensitization time is 45min. In order to analyze the characteristics of sulfur sensitization center quantitatively, the method of the decay kinetics of photoelectron is used in this paper. We first proposed a model of sulfur-sensitized AgCl microcrystals, and then induced a series of kinetics equation. The characteristics curve of photoelectron decay is obtained by solving the kinetics equation, which is in agreement with the experimental curve. Meanwhile the concentration, trap depth and capture cross-section are obtained by computer simulation, which are 1.12ppm, 0.085eV and 1.46×10^-18cm, respectively. Also a possible method to study the mechanism of sulfur sensitization from the perspective of dynamics is suggested.

Citation Download Citation

Xiaowei Li, Yanxia Hu, Rongxiang Zhang, Jixian Zhang, Guoyi Dong, Shaopeng Yang, and Guangsheng Fu "Dynamics analysis of photoelectron decay in cubic AgCl microcrystals by sulfur sensitization", Proc. SPIE 6722, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 67223H (14 November 2007); https://doi.org/10.1117/12.783539

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available