Translator Disclaimer
Paper
30 October 2007 A practical solution to the critical problem of 193 nm reticle haze
Author Affiliations +
Abstract
The authors have developed and successfully implemented a practical, yet effective solution to help eliminate haze formation in the production fab. Based on a novel mechanism of haze formation described earlier, along with a thorough understanding of the reticle surface chemistry changes during the manufacturing process, the authors found an unexpectedly simple and straightforward way to prevent haze formation. This is possible regardless of the origin of the reticle, by controlling the purity of the immediate reticle environment.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Oleg Kishkovich, Dave Halbmaier, Xavier Gabarre, Brian Grenon, James Lo, Andy Lam, and Tom Chen "A practical solution to the critical problem of 193 nm reticle haze", Proc. SPIE 6730, Photomask Technology 2007, 67301A (30 October 2007); https://doi.org/10.1117/12.747511
PROCEEDINGS
11 PAGES


SHARE
Advertisement
Advertisement
Back to Top