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30 October 2007 EMF simulations of isolated and periodic 3D photomask patterns
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Abstract
We present rigorous 3D EMF simulations of isolated features on photomasks using a newly developed finite-element method. We report on the current status of the finite-element solver JCMsuite, incorporating higher-order edge elements, adaptive refinement methods, and fast solution algorithms. We demonstrate that rigorous and accurate results on light scattering off isolated features can be achived at relatively low computational cost, compared to the standard approach of simulations on large-pitch, periodic computational domains.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sven Burger, Lin Zschiedrich, Frank Schmidt, Roderick Köhle, Bernd Küchler, and Christoph Nölscher "EMF simulations of isolated and periodic 3D photomask patterns", Proc. SPIE 6730, Photomask Technology 2007, 67301W (30 October 2007); https://doi.org/10.1117/12.746392
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