Correction technique of EBM-6000 prepared for EUV mask writing

Shusuke Yoshitake; Hitoshi Sunaoshi; Jun Yashima; Shuichi Tamamushi; Munehiro Ogasawara

doi:10.1117/12.747748

30 October 2007 Correction technique of EBM-6000 prepared for EUV mask writing

Shusuke Yoshitake, Hitoshi Sunaoshi, Jun Yashima, Shuichi Tamamushi, Munehiro Ogasawara

Proceedings Volume 6730, Photomask Technology 2007; 673030 (2007) https://doi.org/10.1117/12.747748
Event: SPIE Photomask Technology, 2007, Monterey, California, United States

Abstract

Image placement (IP) errors caused by electro-static chuck (ESC) and non-flatness of mask are additional factors in writing extreme ultra-violet (EUV) mask, and minimizing their influences is being fervently addressed. New correction technique of EBM-6000 has been developed for EUV mask writing based on the conventional grid matching correction (GMC) without ESC to obtain good reproducibility to satisfy user's requirement to develop EUV mask at an early stage.

Citation Download Citation

Shusuke Yoshitake, Hitoshi Sunaoshi, Jun Yashima, Shuichi Tamamushi, and Munehiro Ogasawara "Correction technique of EBM-6000 prepared for EUV mask writing", Proc. SPIE 6730, Photomask Technology 2007, 673030 (30 October 2007); https://doi.org/10.1117/12.747748

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