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2 May 2008 Design of pattern-specific mask grating for giving the effect of an off-axis illumination
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Proceedings Volume 6792, 24th European Mask and Lithography Conference; 67920R (2008) https://doi.org/10.1117/12.798809
Event: 24th European Mask and Lithography Conference, 2008, Dresden, Germany
Abstract
In order to realize the effect of pattern-specific off-axis illumination under the conventional circular illumination, the illumination method using a mask grating formed on the top side of a photo mask was evaluated and improved. Contrary to an off-axis illumination, it could provide the locally different off-axis illumination depending on the pattern shape defined on the bottom side of a mask. The structure of the mask grating was determined from the feature characteristics of the mask pattern and its performance was evaluated with the simulated Bossung curves.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Young-Seok Kim, Seok Ho Song, Jong Ung Lee, Sung Hyun Oh, Yong Kyoo Choi, Munsik Kim, Beom-Hoan O, Se-Geun Park, El-Hang Lee, and Seung Gol Lee "Design of pattern-specific mask grating for giving the effect of an off-axis illumination", Proc. SPIE 6792, 24th European Mask and Lithography Conference, 67920R (2 May 2008); https://doi.org/10.1117/12.798809
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