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2 May 2008 Advances in fabrication of x-ray masks based on vitreous carbon using a new UV sensitive positive resist
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Proceedings Volume 6792, 24th European Mask and Lithography Conference; 679214 (2008) https://doi.org/10.1117/12.798802
Event: 24th European Mask and Lithography Conference, 2008, Dresden, Germany
Abstract
LIGA is a well-established process to fabricate metallic micro parts with high resolution, high precision and very low sidewall roughness by means of X-ray lithography and electroplating. Typical mask substrate materials, e.g. beryllium, carbon based foils, Si3N4 or SiC show different disadvantages such as low X-ray transparency or high toxicity or high prices or low conductivity or high thermal expansion or surface porosity causing X-ray scattering. Due to the amorphous structure of vitreous carbon this mask material proved to significantly reduce the amount of side wall striations, leading to extremely smooth pattern sidewalls. For the fabrication of X-ray masks, PMMA with its unique features such as high aspect ratio patterns with high precision, exhibits low sensitivity and the layers preparation is not easy. SU-8, an epoxy-based UV and X-ray sensitive, chemically amplified negative tone photoresist exhibits high aspect ratio patterns with vertical sidewalls. The difficult remove of the resist after the electroplating process significantly hinders the inspection of the fabricated X-ray mask. We present the suitability of an UV sensitive, chemically amplified, aqueous-alkaline developable, and easy removable positive tone photoresist, XP mr-P 15 AV for the fabrication of X-ray masks by means of UV lithography on vitreous carbon substrates.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Anja Voigt, Josef Kouba, Marina Heinrich, Gabi Gruetzner, Heinz-Ulrich Scheunemann, I. Rudolph, and Christoph Waberski "Advances in fabrication of x-ray masks based on vitreous carbon using a new UV sensitive positive resist", Proc. SPIE 6792, 24th European Mask and Lithography Conference, 679214 (2 May 2008); https://doi.org/10.1117/12.798802
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