Fabrication of SiO2-TiO2 strip waveguides by laser direct writing

Aikui Li; Zemin Wang; Jiajun Liu; Xiaoyan Zeng; Chunxia Wang; Hongda Chen

doi:10.1117/12.785629

4 January 2008 Fabrication of SiO₂-TiO₂ strip waveguides by laser direct writing

Aikui Li, Zemin Wang, Jiajun Liu, Xiaoyan Zeng, Chunxia Wang, Hongda Chen

Proceedings Volume 6825, Lasers in Material Processing and Manufacturing III; 68251O (2008) https://doi.org/10.1117/12.785629
Event: Photonics Asia 2007, 2007, Beijing, China

Abstract

SiO₂-TiO₂ strip optical waveguides have been fabricated by laser densification of SiO₂-TiO₂ sol-gel films using a Ytterbium fiber lasers and following chemical etching process. Effects of laser processing parameters and dried temperature of SiO₂-TiO₂ sol-gel films on the dimensions of strip optical waveguides were systematically studied. And the mechanism on laser densification of SiO₂-TiO₂ films was discussed. The experimental results demonstrate that the width and thickness of strip waveguides increase with laser power density until SiO₂-TiO₂ films are damaged by laser irradiation. The available range of laser power density for laser densification increase through enhancing dried temperature of SiO₂-TiO₂ films, which mainly thanks to the increasing stress capacity in the films. The width of strip optical waveguides can be markedly decreased from 110 to 25 μm in the case of the same thickness by enlarging available range of laser power density. The mechanism on laser densification of SiO₂-TiO₂ films is mainly based on shrinkage of nanoscale pore within SiO₂-TiO₂ films duo to the energy transferred from silicon substrate.

Citation Download Citation

Aikui Li, Zemin Wang, Jiajun Liu, Xiaoyan Zeng, Chunxia Wang, and Hongda Chen "Fabrication of SiO₂-TiO₂ strip waveguides by laser direct writing", Proc. SPIE 6825, Lasers in Material Processing and Manufacturing III, 68251O (4 January 2008); https://doi.org/10.1117/12.785629

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