Study of the image quality based on MTF in volume hologram storage system

Tao Geng; Da-Bo Liu; Zhi-Yuan Jiang; Kun Bi; Tao Zhang; Qiang Dai

doi:10.1117/12.755041

21 November 2007 Study of the image quality based on MTF in volume hologram storage system

Tao Geng, Da-Bo Liu, Zhi-Yuan Jiang, Kun Bi, Tao Zhang, Qiang Dai

Proceedings Volume 6827, Quantum Optics, Optical Data Storage, and Advanced Microlithography; 68271C (2007) https://doi.org/10.1117/12.755041
Event: Photonics Asia 2007, 2007, Beijing, China

Abstract

The combination of excellent linear, nonlinear properties and good mass productivity of lithium niobate (LiNbO₃) single crystals has made them important for extensive industrial applications. However, when LiNbO₃ devices, such as frequency doubling converters, waveguide lasers, optical switches, and parametric oscillators, are operated at a high laser intensity, their optical performance is severely restricted by the laser-induced refractive index inhomogeneity, which has been labeled "optical damage" or "photorefraction". Especially, when LiNbO₃ crystals are used as holographic storage media, higher light-induced scattering resistance ability can improve the quality of the storage information, suppress the generation of noise, and reduce the bit error rate. There are many factors to influence the bit error rate of read-out image in holographic storage. Above all, SLM and CCD play the key role as well as the signal matching between these devices. In this paper, the output response of CCD to the periodic pixel distribution of SLM is analyzed based on the modulation transfer function theory and numerical simulation method. The influence of fill-factor, contrast and phase matching between CCD and SLM on bit error rate are also studied. Finally, the computer simulation result on bit error is given in this paper.

Citation Download Citation

Tao Geng, Da-Bo Liu, Zhi-Yuan Jiang, Kun Bi, Tao Zhang, and Qiang Dai "Study of the image quality based on MTF in volume hologram storage system", Proc. SPIE 6827, Quantum Optics, Optical Data Storage, and Advanced Microlithography, 68271C (21 November 2007); https://doi.org/10.1117/12.755041

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