Improvement on thickness uniformity of large-area DLC thin films deposited by femtosecond pulsed laser

Jinfan Liu; Guangzhi Zhang; Xiao Yuan

doi:10.1117/12.757987

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4 January 2008 Improvement on thickness uniformity of large-area DLC thin films deposited by femtosecond pulsed laser

Jinfan Liu, Guangzhi Zhang, Xiao Yuan

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Proceedings Volume 6831, Nanophotonics, Nanostructure, and Nanometrology II; 68310I (2008) https://doi.org/10.1117/12.757987
Event: Photonics Asia 2007, 2007, Beijing, China

Abstract

A off-axis deposition method, which aligns the edge of the substrate to the normal of the plasma plume and makes the edge of the plasma plume at the center of the substrate, is used to deposit large-area DLC films. The distance between the target and the substrate and the deposition time are optimized to obtain uniform and large area DLC films on the K9, fused silica glasses and ZnS with the diameter of 50 mm. It is shown that the thickness uniformity of the films with off-axis deposition method is much better than that with the on-axis method. The thickness uniformity for off-axis and on-axis deposition is compared, and the possibility for preparing large-area uniform films is discussed. In addition, the transmission of ZnS with DLC coated is improved.

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Jinfan Liu, Guangzhi Zhang, and Xiao Yuan "Improvement on thickness uniformity of large-area DLC thin films deposited by femtosecond pulsed laser", Proc. SPIE 6831, Nanophotonics, Nanostructure, and Nanometrology II, 68310I (4 January 2008); https://doi.org/10.1117/12.757987

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