Fabrication of 200 nm period x-ray transmission gratings using electron beam lithography

Xiaoli Zhu; Changqing Xie; Tianchun Ye; Min Zhao; Jie Ma; Ji Jiang; Jiebin Niu; Ming Liu

doi:10.1117/12.758100

4 January 2008 Fabrication of 200 nm period x-ray transmission gratings using electron beam lithography

Xiaoli Zhu, Changqing Xie, Tianchun Ye, Min Zhao, Jie Ma, Ji Jiang, Jiebin Niu, Ming Liu

Proceedings Volume 6832, Holography and Diffractive Optics III; 68320V (2008) https://doi.org/10.1117/12.758100
Event: Photonics Asia 2007, 2007, Beijing, China

Abstract

X-ray transmission gratings (TG) have attracted much interest because of its wide use in x-ray telescope, synchrotron radiation facilities, and target diagnostic in inertial confinement fusion, etc. In this work, a 200 nm period master TG to diffract x-ray in the energy range 0.1-8keV has been successfully fabricated by electron beam lithography followed by gold electroplating. In fabrication processes, 500 nm resist was exposed by focused electron beam on polyimide free-standing-membrane coated with a Cr/Au plating base. According to numerical simulation, the proximity effect due to electron back-scattering from the substrate can be sharply reduced because of the thin polyimide free-standing membrane substrates. PMMA resist was chosen due to its high resolution and good performance in subsequent processes. After delicate dose test and shape modification of the proximity effect caused by electron front-scattering, resist grating bars with 95 nm width and 200 nm period were achieved. Subsequently, resist patterns were transferred to gold layer by electroplating. In future work, with this master mask of TG, thousands of TG to diffract x-ray can be sufficiently replicated using x-ray lithography.

Citation Download Citation

Xiaoli Zhu, Changqing Xie, Tianchun Ye, Min Zhao, Jie Ma, Ji Jiang, Jiebin Niu, and Ming Liu "Fabrication of 200 nm period x-ray transmission gratings using electron beam lithography", Proc. SPIE 6832, Holography and Diffractive Optics III, 68320V (4 January 2008); https://doi.org/10.1117/12.758100

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
6 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

X-ray lithography

X-rays

Electron beam lithography

Electroplating

Gold

Polymethylmethacrylate

Photomasks

Show All Keywords

Keywords/Phrases

Search In:

Publication Years