Multilayer Reflectors for the 200 A Region

Felix E. Fernandez; Charles M. Falco

doi:10.1117/12.964829

9 April 1987 Multilayer Reflectors for the 200 Å Region

Felix E. Fernandez, Charles M. Falco

Proceedings Volume 0688, Multilayer Structures & Laboratory X-Ray Laser Research; (1987) https://doi.org/10.1117/12.964829
Event: 30th Annual Technical Symposium, 1986, San Diego, United States

Abstract

Silicon/tungsten multilayer normal-incidence mirrors with maximum reflectance at 212 Å have been designed and studied. Details of the fabrication and characterization techniques are given. Preliminary results of synchrotron measurements show agreement with calculations based on microscopic structure of these multilayers. The Si/W combination has desirable characteristics for use in X-UV or soft x-ray devices.

Citation Download Citation

Felix E. Fernandez and Charles M. Falco "Multilayer Reflectors for the 200 Å Region", Proc. SPIE 0688, Multilayer Structures & Laboratory X-Ray Laser Research, (9 April 1987); https://doi.org/10.1117/12.964829

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