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12 February 2008 Engineering the spectral response of waveguide Bragg gratings patterned by deep ultraviolet nanolithography
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Abstract
We demonstrate the use of deep ultraviolet (DUV) reduction photolithography, today's foremost commercial nanofabrication technology, in the patterning of integrated nanophotonic filters based on etched channel waveguide gratings. DUV photolithographic fabrication is seen to enable control over individual grating lines at the level of nanometers enabling spectral engineering of the filter function in unprecedented fashion. Novel filter apodization approaches are introduced and demonstrated that uniquely leverage DUV nanofabrication power. The demonstrated filter functions are highly relevant for coarse wavelength division multiplexing and fiber to the premise applications.
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C. M. Greiner, D. Iazikov, Thomas W. Mossberg, B. McGinnis, R. Narevich, and A. Ticknor "Engineering the spectral response of waveguide Bragg gratings patterned by deep ultraviolet nanolithography", Proc. SPIE 6896, Integrated Optics: Devices, Materials, and Technologies XII, 68960G (12 February 2008); https://doi.org/10.1117/12.764054
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