Vertically integrated multimode interferometers for 3-D photonic circuits in SOI

Chris J. Brooks; Andrew P. Knights; Paul E. Jessop

doi:10.1117/12.763470

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26 February 2008 Vertically integrated multimode interferometers for 3-D photonic circuits in SOI

Chris J. Brooks, Andrew P. Knights, Paul E. Jessop

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Proceedings Volume 6898, Silicon Photonics III; 68980Z (2008) https://doi.org/10.1117/12.763470
Event: Integrated Optoelectronic Devices 2008, 2008, San Jose, California, United States

Abstract

We present vertically-integrated multimode interferometers that optically couple between waveguide layers of a three-dimensional photonic circuit. Coupling between these layers can be restricted to certain regions by selectively fabricating a silicon channel between them, resulting in an isolated multimode waveguide section. Simulations reveal that complete coupling between two waveguides that are 2 μm square is achieved over a length of 236 μm, when the separating silicon channel is 1 μm thick. Standard photolithography and etching techniques are used to fabricate a proof-of-concept device consisting of one waveguide coupling into a silicon waveguide that is vertically multimode.

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Chris J. Brooks, Andrew P. Knights, and Paul E. Jessop "Vertically integrated multimode interferometers for 3-D photonic circuits in SOI", Proc. SPIE 6898, Silicon Photonics III, 68980Z (26 February 2008); https://doi.org/10.1117/12.763470

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