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29 January 2008 Excimer laser projection photoablation and lift-off process for patterning of indium-tin-oxide for cost-effective fabrication of flat-panel displays
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Abstract
Indium-Tin-Oxide (ITO), which is commonly used in the flat-panel display industry as a transparent conductive oxide, was patterned cleanly by a non-photolithographic process. For the patterning of ITO on a silicon nitride substrate, the substrate was coated with photoresist which was patterned by the photoablation process using a KrF (wavelength of 248nm) excimer laser with low fluence conditions. ITO was then deposited on the patterned photoresist by sputtering, and the final ITO pattern was produced by lift-off. The resulting ITO pattern was clean even though it was patterned without a conventional photoresist development step and a conventional ITO etching step. This process technology does not require a developing process and an etching process to make a pattern on the substrate. A reduction of two process steps will result in substantial cost savings in high-volume production. The production time for the fabrication cycle and the equipment maintenance will also be decreased. Besides the application of this process to ITO patterning in TFT-LCD (Thin Film Transistor Liquid Crystal Display) fabrication, it can also be used for patterning other materials and device structures. It is attractive for a variety of applications in the fabrication of flat-panel displays, other microelectronic devices and device packaging, because it enables low cost and high throughput.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Junghun Chae, Sreeram Appasami, and Kanti Jain "Excimer laser projection photoablation and lift-off process for patterning of indium-tin-oxide for cost-effective fabrication of flat-panel displays", Proc. SPIE 6911, Emerging Liquid Crystal Technologies III, 69110P (29 January 2008); https://doi.org/10.1117/12.767827
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