NIL mold manufacturing using self-organized diblock copolymer as patterning template

Naoko Kihara; Hiroyuki Hieda; Katsuyuki Naito

doi:10.1117/12.771630

20 March 2008 NIL mold manufacturing using self-organized diblock copolymer as patterning template

Naoko Kihara, Hiroyuki Hieda, Katsuyuki Naito

Proceedings Volume 6921, Emerging Lithographic Technologies XII; 692126 (2008) https://doi.org/10.1117/12.771630
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

A low-cost fabrication method combining self-organized lithography and nanoimprint is proposed as a possible solution for patterned media production for the memory density beyond 1 Tbpsi. For that purpose, imprint mold equipped with 30-nm-pitch pillar pattern was formed on a Si substrate using diblock copolymer template. Room-temperature imprint and ion milling were applied to avoid thermal and chemical damage to magnetic film during a patterning process. The obtained aspect ratio of the relief by room-temperature imprint was enhanced via pattern-inverse process. After ionmilling treatment, 30-nm-pitch magnetic dot array with 20 nm height was observed. A nickel replica mold was formed by electroforming applying the Si mold as an original master. These results indicate the possibility that nanoimprinting is a practical method for 1 Tbpsi patterned media production.

Citation Download Citation

Naoko Kihara, Hiroyuki Hieda, and Katsuyuki Naito "NIL mold manufacturing using self-organized diblock copolymer as patterning template", Proc. SPIE 6921, Emerging Lithographic Technologies XII, 692126 (20 March 2008); https://doi.org/10.1117/12.771630

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