Integration issues in step and repeat UV nanoimprint lithography

C. Charpin-Nicolle; M. Irmscher; M. Pritschow; B. Vratzov; H. van Vossen; J. Chiaroni; J. Massin; P. Gubbini

doi:10.1117/12.790732

1 April 2008 Integration issues in step and repeat UV nanoimprint lithography

C. Charpin-Nicolle, M. Irmscher, M. Pritschow, B. Vratzov, H. van Vossen, J. Chiaroni, J. Massin, P. Gubbini

Proceedings Volume 6921, Emerging Lithographic Technologies XII; 69212I (2008) https://doi.org/10.1117/12.790732
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

Nanoimprint Lithography appears to be a competitive candidate for Next Generation Lithography in semiconductor industry due to its advantages concerning resolution and cost effectiveness. Moreover, UV-Nanoimprint Lithography (UV-NIL) should enable to reach good overlay values, which is also a major criterion for integration. In this paper, we present first integration results which were obtained on lines and contact holes. A specific template was designed for this purpose in collaboration with CEA-LETI, IMS and Molecular Imprints. This template was characterized by using various techniques (optical and SEM techniques) and showed quite a good quality of the template; in particular, 50 nm holes were defined. Molecular Imprints process was then tested by using Imprio55® at MESA+ Research Institute, University of Twente (Netherlands). In these experiments, 37 4.8 cm² fields were imprinted on Double Side Polished wafers. For each field, 52 droplets were dispensed with various volumes. Resolution and non-uniformity were evaluated after imprinting. Then etching tests were performed.

Citation Download Citation

C. Charpin-Nicolle, M. Irmscher, M. Pritschow, B. Vratzov, H. van Vossen, J. Chiaroni, J. Massin, and P. Gubbini "Integration issues in step and repeat UV nanoimprint lithography", Proc. SPIE 6921, Emerging Lithographic Technologies XII, 69212I (1 April 2008); https://doi.org/10.1117/12.790732

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available