Modeling for metrology with a helium beam

Ranjan Ramachandra; Brendan J. Griffin; David C. Joy

doi:10.1117/12.772300

24 March 2008 Modeling for metrology with a helium beam

Ranjan Ramachandra, Brendan J. Griffin, David C. Joy

Proceedings Volume 6922, Metrology, Inspection, and Process Control for Microlithography XXII; 69221W (2008) https://doi.org/10.1117/12.772300
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

IONiSE is a Monte Carlo simulation which describes the interactions of 5-50 keV energy He+ ions with solids, and predicts the production of ion induced secondary electron (iSE) emission. Its use to determine the most probable implant depth, the maximum ion range, and the effect of straggle are presented. IONiSE has been used to numerically fit literature tabulations of iSE generation from five elements so as to derive excitation energy and mean free path parameters. By employing those parameters in IONiSE the topographic yield variation for iSE as a function of energy and the atomic number of the target has been predicted, and estimates of the individual secondary electron contributions from the incident and backscattered ions have been made. These simulations help to create a foundation for the application and the interpretation of iSE images for metrology.

Citation Download Citation

Ranjan Ramachandra, Brendan J. Griffin, and David C. Joy "Modeling for metrology with a helium beam", Proc. SPIE 6922, Metrology, Inspection, and Process Control for Microlithography XXII, 69221W (24 March 2008); https://doi.org/10.1117/12.772300

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