Spectroscopic ellipsometer for ultra thin film

Kumiko Akashika; Shuji Shiota; Shinji Yamaguchi; Masahiro Horie; Masayoshi Kobayashi

doi:10.1117/12.772414

26 March 2008 Spectroscopic ellipsometer for ultra thin film

Kumiko Akashika, Shuji Shiota, Shinji Yamaguchi, Masahiro Horie, Masayoshi Kobayashi

Proceedings Volume 6922, Metrology, Inspection, and Process Control for Microlithography XXII; 69223M (2008) https://doi.org/10.1117/12.772414
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

As semiconductor technology has advanced, the films have become thinner and changed to multi-layer films, such as gate dielectric construction. To deal with these trends, we are continuing development of our spectroscopic ellipsometer with elliptical polarization. We chose a Rotating-Analyzer Ellipsometer (RAE) configuration. The incident light in this type of device is usually polarized linearly, because polarizers do not disperse the light. But the incident light in the ellipsometer described in this paper is elliptical, which has a nearly circular polarization. In this paper, we introduce a technique for solving the dispersion problem.

Citation Download Citation

Kumiko Akashika, Shuji Shiota, Shinji Yamaguchi, Masahiro Horie, and Masayoshi Kobayashi "Spectroscopic ellipsometer for ultra thin film", Proc. SPIE 6922, Metrology, Inspection, and Process Control for Microlithography XXII, 69223M (26 March 2008); https://doi.org/10.1117/12.772414

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