Acid-base equilibrium in chemically amplified resist

Kenichiro Natsuda; Takahiro Kozawa; Kazumasa Okamoto; Seiichi Tagawa

doi:10.1117/12.772165

26 March 2008 Acid-base equilibrium in chemically amplified resist

Kenichiro Natsuda, Takahiro Kozawa, Kazumasa Okamoto, Seiichi Tagawa

Proceedings Volume 6923, Advances in Resist Materials and Processing Technology XXV; 69231A (2008) https://doi.org/10.1117/12.772165
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

In chemically amplified resists, amines (base compounds) play important roles such as the　control of acid diffusion, the sharpening of image slope and the improvement of environmental resistivity of resist materials. However, the details in the reactions between amines and protons in solid films are still unknown. In this research, we have investigated the neutralization of acids by amines in poly(4-hydroxystyrene) (PHS). Proton dynamics in the presence of amines in PHS films is discussed.

Citation Download Citation

Kenichiro Natsuda, Takahiro Kozawa, Kazumasa Okamoto, and Seiichi Tagawa "Acid-base equilibrium in chemically amplified resist", Proc. SPIE 6923, Advances in Resist Materials and Processing Technology XXV, 69231A (26 March 2008); https://doi.org/10.1117/12.772165

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available