Characterization of resist and topcoat properties for immersion lithography

Kaveri Jain; Yoshi Hishiro

doi:10.1117/12.773318

4 April 2008 Characterization of resist and topcoat properties for immersion lithography

Kaveri Jain, Yoshi Hishiro

Proceedings Volume 6923, Advances in Resist Materials and Processing Technology XXV; 692320 (2008) https://doi.org/10.1117/12.773318
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

For this paper, we have performed a fundamental characterization of various resists and topcoats supplied by different vendors. The resists and topcoats were selected based on the inherent properties of these chemicals (elemental composition, contact angle, etc.). The goal of this study is to better understand the resist and topcoat interaction under various process conditions. We have characterized these materials using a number of analytical techniques such as atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS). We have also provided data on the effect of the constitution of the resist and topcoat materials on the resist profile, under both dry and immersion exposure.

Citation Download Citation

Kaveri Jain and Yoshi Hishiro "Characterization of resist and topcoat properties for immersion lithography", Proc. SPIE 6923, Advances in Resist Materials and Processing Technology XXV, 692320 (4 April 2008); https://doi.org/10.1117/12.773318

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