Achieving small dimensions with an environmentally friendly solvent: photoresist development using supercritical CO2

Nelson M. Felix; Anuja De Silva; Jing Sha; Christopher K. Ober

doi:10.1117/12.772635

4 April 2008 Achieving small dimensions with an environmentally friendly solvent: photoresist development using supercritical CO2

Nelson M. Felix, Anuja De Silva, Jing Sha, Christopher K. Ober

Author Affiliations +

Proceedings Volume 6923, Advances in Resist Materials and Processing Technology XXV; 69233L (2008) https://doi.org/10.1117/12.772635
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

Dissolution rates of molecular glass photoresists in supercritical CO2 have been measured with the assistance of an interferometric dissolution rate monitor coupled to the supercritical CO2 vessel. Data show that fully protected polyphenolic molecular glass cores can show dissolution rates >500 nm/min depending on processing conditions. This extends to large branched structures and ring-type molecules approaching molecular weight 2000 g/mol. Molecular glass resists of this type that possess glass transition temperatures above 100oC can be patterned and developed in scCO2 with resolution <65 nm. Using these concepts, positive-tone photoresists based on acid-catalyzed decrosslinking reactions have also been developed. This represents the first report of intrinsically positive tone photoresists developable in pure scCO2.

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Nelson M. Felix, Anuja De Silva, Jing Sha, and Christopher K. Ober "Achieving small dimensions with an environmentally friendly solvent: photoresist development using supercritical CO2", Proc. SPIE 6923, Advances in Resist Materials and Processing Technology XXV, 69233L (4 April 2008); https://doi.org/10.1117/12.772635

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